PREVAC | Technology for science and industry 11.11.2026 00:44

Electron beam evaporator EBV 40A1

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Electron beam evaporator EBV 40A1

The electron beam evaporator EBV 40A1 is designed for ultra-pure sub-monolayer and multilayer MBE thin film growth.

Description

The precisely defined evaporant beam means highly uniform deposition on the sample, the deposition area being determined by the distance from the E-beam evaporator to the sample and the choice of one of the easily exchangeable exit apertures. The electron beam evaporator EBV 40A1 is configured with choice of manual or automatic shutter. Custom insertion length 190 – 345 mm (other on request).

Technical data

Mounting flange DN 40CF (rotatable)
Temperature range (for evaporated materials) 160 °C – 2300 °C (3300 °C for molybdenum connector)
Filament current typically 1.8 – 2.2 A, max 2.3 A
Evaporating rod diameter 2 mm standard (other on request), step 2 mm, wire feed 25 mm wire length 43 mm
Water cooling (required) water flow: > 0.5 l/min., temperature: 20-30 °C, max pressure: 6 bar
Exit aperture diameters set 1: ID 4, ID 6, ID 7.4 (standard) set 2: ID 10, ID 14, ID 19
Type of shutter manual or pneumatic
Power – 50 W for high vapor pressure materials
– up to 200 W for crucibles and thick wires
Energy range 1 – 1500 eV
Cathode type thoriated tungsten
Crucible type (option) Knudsen cell type made from: Mo, W, liner PBN, Al2O3
Crucibles volume 0.07 ml
Evaporated materials all typical materials according to crucible type
Others – flux regulation via ion current incl. electrode, feedthrough, display unit and PID-regulator
– rear-loading evaporant
Insertion length min. 190 mm (other on request) OD: 34.8 mm
Deposition area dependent on working distance (e.g. 6 mm for distance 25 mm – ID 4, 33 mm for distance 75 mm – ID 19)
Working distance 25 – 75 mm (optimum)
Bakeout temperature up to 250°C
Working pressure <10-5 mbar

Features

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