1-4 axes MBE manipulators
The 1-4 axes motorised MBE manipulator is designed for MBE applications under ultra-high vacuum conditions. Heating is performed by resistive or EB methods. The manipulator can work in the vertical orientation.
It is a high precision, high rigidity, UHV specimen manipulator of modular construction, suitable for a range of R1 motorised continuous substrate rotation and Z translation
Description
Prepared to heat the substrate up to 1400°C (EB heating, UHV conditions) with accuracy +/- 1°C. The station includes the substrate (standard up to 6-inch sample holder) positioner and allows precise angular position of the substrate in relation to linear shutter.
▪ Sample holders: generally Plate style
▪ Prepared for reaching the high temperature
▪ Base pressure: 10-11 mbar
Technical data
| Standard base flange | DN 100CF to DN 300CF (depending on the sample size, other on request) |
| Base pressure range | 10-11 mbar |
| Shutter | integrated or external, pneumatic or manual |
| Heating methods | resistive, EB |
| Substrate temperature | up to 1200 °C (resistive) up to 1400 °C (EB) |
| Cooling method | LN2, H20 |
| Z range | 50 mm (other on request) |
| positional control | handwheel/motorised* |
| resolution (manual/motorised) | 500 μm / standard 10 μm |
| R1 range | 360° continuous |
| positional control | motorised* |
| XY range (option) |
± 12.5 mm |
| positional control | micrometer/motorised* |
| resolution (manual/motorised) | 5 μm / 1 μm |
| Max speed | up to 60 rpm |
| Bakeout temperature | up to 150 °C / 200 °C (on request) |
* stepper motor or servomotor – depend on application.
Manipulator can be prepared for customer motors or drivers – on request.
HEATER MATERIALS
| Graphite | flexible (stable in form), minimal outgassing at the high temperatures, oxidation resistant below 500°C |
| Graphite + PBN coating | flexible (stable in form), minimal outgassing at the high temperatures, oxidation resistant below 800°C (depends on partial pressure of oxygen) |
| Graphite + SiC coating | hard, light and stable in form, oxidation resistant below 1400°C |
| SiC solid (β) | extremely hard, light and stable in form, low thermal expansion, durable to mechanical and electrical shocking, excellent resistance to reactive gases/oxidation |
Option
▪ H2O shroud
▪ LN2 or H2O cooling
▪ side or integrated wedge shutter (possible with H2O cooling option)
▪ XY movement stage
▪ shutter on/off
Gallery
