Description
Prepared to heat the substrate up to 1400°C (EB heating, UHV conditions) with accuracy +/- 1°C. The station includes the substrate (standard up to 6-inch sample holder) positioner and allows precise angular position of the substrate in relation to linear shutter.
▪ Sample holders: generally Plate style
▪ Prepared for reaching the high temperature
▪ Base pressure: 10-11 mbar
Technical data
Standard base flange |
DN 100CF to DN 300CF (depending on the sample size, other on request) |
Base pressure range |
10-11 mbar |
Shutter |
integrated or external, pneumatic or manual |
Heating methods |
resistive, EB |
Substrate temperature |
up to 1200 °C (resistive)
up to 1400 °C (EB) |
Cooling method |
LN2, H20 |
Z range |
50 mm (other on request)
|
positional control |
handwheel/motorised* |
resolution (manual/motorised) |
500 μm / standard 10 μm |
R1 range |
360° continuous |
positional control |
motorised* |
XY range (option)
|
± 12.5 mm |
positional control |
micrometer/motorised* |
resolution (manual/motorised) |
5 μm / 1 μm |
Max speed |
up to 60 rpm |
Bakeout temperature |
up to 150 °C / 200 °C (on request) |
* stepper motor or servomotor – depend on application.
Manipulator can be prepared for customer motors or drivers – on request.
HEATER MATERIALS
Graphite |
flexible (stable in form), minimal outgassing at the high temperatures, oxidation resistant below 500°C |
Graphite + PBN coating |
flexible (stable in form), minimal outgassing at the high temperatures, oxidation resistant below 800°C (depends on partial pressure of oxygen) |
Graphite + SiC coating |
hard, light and stable in form, oxidation resistant below 1400°C |
SiC solid (β) |
extremely hard, light and stable in form, low thermal expansion, durable to mechanical and electrical shocking, excellent resistance to reactive gases/oxidation |
Option
▪ H2O shroud
▪ LN2 or H2O cooling
▪ side or integrated wedge shutter (possible with H2O cooling option)
▪ XY movement stage
▪ shutter on/off