Description
Prepared to heat the substrate up to 1400°C (EB heating, UHV conditions) with accuracy +/- 1°C. The station includes the substrate (standard up to 6-inch sample holder) positioner and allows precise angular position of the substrate in relation to linear shutter.
▪ Sample holders: generally Plate style
▪ Prepared for reaching the high temperature
▪ Base pressure: 10-11 mbar