Description
Available for substrate sizes from 2″ to 12″, and designed as interchangeable modules, they integrate seamlessly into our manipulators and sample stages, or serve as standalone components in custom setups.
Whether you need stable temperature control for a sensitive experiment or high-temperature processing across a large substrate, our modules are built to hold uniformity where it matters most: across the sample.
Precise, uniform, reliable heating for UHV and thin-film applications
Key Features
Full range of substrate sizes. Available from 2″ research samples up to 12″ wafers.
Wide temperature range. Resistive heating up to 1000 °C under precise PID control, extended to 1200 °C in dedicated configurations – covering the full range from gentle degassing to high-temperature growth and annealing.
Uniform heating across the substrate. Engineered to maintain temperature uniformity across the whole sample.
Built for UHV. Materials and construction selected for clean, low-outgassing operation and reliable performance under ultra-high vacuum.
Oxygen-compatible heating. Our sSiC heater option operates reliably in oxygen atmospheres, enabling high-temperature processes under oxidising conditions where conventional metal heaters would degrade.
Applications
PREVAC heater modules are used across a wide range of vacuum and thin-film processes, including:
- Substrate heating for magnetron sputtering, PLD and MBE
- Sample preparation and annealing for surface analysis
- High-temperature treatment of wafers and other substrates
- Degassing and cleaning under UHV
