The Beam Flux Monitor enables measurement of the beam equivalent pressure (BEP) in MBE applications.
It is typically mounted on a linear shift/z-stage to allow the filament to be positioned near to the substrate and includes a protection shield when in the standby position.
Readouts and full control (device status, Z-axis shift) are provided by dedicated software application and Ion Multi Gauge Controller. Application can be integrated with Synthesium – advanced deposition software tool.
| Mounting flange | DN 63CF (non-rotatable) |
| Measurement system | Bayard-Alpert ion gauge |
| Measurement range | 10-3 to 2×10-11 Torr |
| Linear stroke | 150 mm (other on request) |
| Max. outer diameter | 63 mm |
| Filament | dual filament, ytrium coated iridium |
| Controller | 3 channel MG15 – communication interface: RS232/485, Ethernet, PROFINET (option – specify at order) |
| Bakeout temperature | up to 200 °C |
