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Electron source ES 40C1

Electron source ES 40C1
Electron source ES 40C1 - Image 2
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Electron source ES 40C1

Scanable electron source with small spot profile. Due to the high transmission of its Einzel-Lens, the ES 40C delivers a high electron beam current over a wide energy range. The ES 40C1 is designed for a stable and reliable operation in e.g. AES, scanning applications, imaging, EELS.

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Technical data

Mounting flange DN 40CF (rotatable)
Energy range 0 – 5 keV
Sample current up to 100 μA
Scan area 10 mm x 10 mm
Shield Cu or μ-metal
Cathode type thoriated tungsten
Insertion length min. 155.7 mm, (other on request) OD: 33.5 mm (μ-metal), 35 mm (Cu)
FWHM dependent on working distance, min. 120 µm (for distance 56 mm)
Working distance 23 mm – 150 mm (typical 75 mm)
Bakeout temperature up to 250 °C
Working pressure < 5×10-6 mbar

Features

  • Fine focus microformed tip cathode
  • Scannable electron source with a small spot profile
  • Correction of incident electron beam angle (provided by ES40-PS power supply)
  • Integrated scan and deflection unit

Options

  • Linear shift
  • Customised insertion length
  • Source shielding material (μ-metal or copper)

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