Description
The UHV research systems designed to operate as both a stand-alone devices, or as an end-stations in synchrotron installations.
The frame has easy height and x-y adjustment for quick and easily reproduced alignment to an external light source (synchrotron or laser). Multitechnique analytical chamber integrates different surface analysis methods like ARPES, UPS, XAS or LEED. Fabricated from mu-metal and designed for energy resolution better than 0.5 meV.