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1-4 axes sputtering manipulators

The 1-4 axes motorised sputtering manipulator is designed for sputter deposition applications under HV and UHV conditions, and for reactive sputtering. Heating is performed by resistive method. The manipulator can work in the vertical orientation.

It is a high rigidity, UHV specimen manipulator of modular construction, with motorised continuous substrate R1 rotation and Z translation (additionally can be equipped with XY movement module).

 

 

SKU: 377 Category:

Description

[vc_row][vc_column][vc_column_text]Prepared to heat the substrate up to 1000°C with accuracy +/- 1°C. The station includes the substrate (standard up to 6 inch sample holder) positioner and allows precise angular position of substrate in relation to linear shutter.

The heater material is optimally adapted depending on the customer’s requirements and the specific conditions of the deposition process (e.g. heating temperature, presence of reactive gases). Exemplary heaters: thermocoax, graphite coated with SiC, SiC solid (β).

▪ Sample holders: Plate style, PTS
▪ Base pressure: 10-10 mbar (working pressure: ~10-2 mbar)[/vc_column_text][/vc_column][/vc_row]

Technical data

Standard base flange DN 100CF, DN 160CF, DN 200CF or DN 250CF
Base pressure range 10-10 mbar
Shutter integrated or external, pneumatic or manual
Heating methods Heating methods resistive, direct
Substrate temperature up to 1000 °C
Cooling method H20
Z range 50 mm (other on request)
   positional control handwheel/motorised*
   resolution (manual/motorised) 500 μm / standard 10 μm (1 μm on request)
R1 range 360° continuous
   positional control motorised*
XY range (option)
± 12.5 mm
   positional control micrometer/motorised*
   resolution (manual/motorised) 5 μm / 1 μm
Max speed up to 60 rpm (other on request)
Bakeout temperature up to 150 °C

* stepper motor or servomotor – depend on application.
Manipulator can be prepared for customer motors or drivers – on request.

Options

▪ H2O cooling shield
▪ side or integrated wedge shutter
▪ XY movement stage
▪ BIAS, DC, RF

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