Sample holders (substrate holders, plates, wafers, molyblocs) dedicated for different deposition techniques, such as MBE, magnetron sputtering, thermal evaporation and others.
Sample holders (wafers, molyblocs) dedicated for different deposition techniques, such as MBE, magnetron sputtering, thermal evaporation and others. Available in 2“, 3“, 4“ diameter size as standard (6“, 8“ and larger on request). The holder can be configured with adaptations for single and multiples of other types of sample holders, for example flag style plates. Standard material is molybdenum or titanium, other materials are available on request.
| Type | Size [inch] | Heating
methods |
Heating
temperature |
Holder
material |
Options / features |
| wafer plate | 1, 2, 3, 4, 6, 8 | resistive | 1000 ÷ 1200 °C | Mo, Ti, Ta | for direct wafer mounting or for sample
mounting |
| EB | 1400 °C | ||||
| 3-pins plate | 1, 2, 3, 4, 6, 8 | resistive | 1000 ÷ 1200 °C | Mo, Ti, Ta | for direct wafer mounting or for sample
mounting |
| EB | 1400 °C | ||||
| 4-holes plate
standard |
1, 2, 3, 4, 6, 8 | resistive | 1000 ÷ 1200 °C | Mo, Ti, Ta | for direct wafer mounting or for sample
mounting |
| EB | 1400 °C | ||||
| 4-holes plate
with adapter for flag sample holders |
1, 2, 3, 4, 6, 8 | resistive | 1000 ÷ 1200 °C | Mo, Ti, Ta | adapter for 1, 2 or 3 flag sample holders |
| EB | 1400 °C | ||||
| 4-holes plate
with pedestal |
1, 2, 3, 4, 6, 8 | resistive | 1000 ÷ 1200 °C | Mo, Ti, Ta | |
| EB | 1400 °C | ||||
| 4-holes plate
with masks |
1, 2, 3, 4, 6, 8 | resistive | 1000 ÷ 1200 °C | Mo, Ti, Ta | different masks geometry possible |
| EB | 1400 °C | ||||
| 4-holes plate
special design |
1, 2, 3, 4, 6, 8 | resistive | 1000 ÷ 1200 °C | Mo, Ti, Ta | e.g. for small or irregular samples |
| EB | 1400 °C |
NOTE | heating and cooling method and temperature depends on the manipulator
