Description
It is prepared to heat the substrate up to 1000°C with accuracy +/- 1°C. The station includes the substrate (standard up to 6-inch sample holder) positioner and allows precise angular position of the substrate in relation to linear shutter.
The heater material is optimally adapted depending on the customer’s requirements and the specific conditions of the deposition process (e.g. heating temperature, presence of reactive gases). Exemplary heaters: thermocoax, graphite coated with SiC, SiC solid (β).
▪ Sample holders: PTS, Plate style, Flag style
▪ Base pressure: 10-10 mbar (working pressure: ~10-2 mbar)
Technical data
| Standard base flange |
DN 100CF, DN 160CF, DN 200CF or DN 250CF |
| Base pressure range |
10-10 mbar |
| Shutter |
integrated or external, pneumatic or manual |
| Heating methods |
Heating methods resistive, direct |
| Substrate temperature |
up to 1000 °C |
| Cooling method |
H20 |
| Z range |
50 mm (other on request)
|
| positional control |
handwheel/motorised* |
| resolution (manual/motorised) |
500 μm / standard 10 μm (1 μm on request) |
| R1 range |
360° continuous |
| positional control |
motorised* |
XY range (option)
|
± 12.5 mm |
| positional control |
micrometer/motorised* |
| resolution (manual/motorised) |
5 μm / 1 μm |
| Max speed |
up to 60 rpm (other on request) |
| Bakeout temperature |
up to 150 °C |
* stepper motor or servomotor – depend on application.
Manipulator can be prepared for customer motors or drivers – on request.
Options
▪ H2O cooling shield
▪ Side or integrated wedge shutter
▪ XY movement stage
