Description
Fully automated process-driven recipes combine highly flexible laser optics and operating pressure ranges, placing the system in a unique position to support leading-edge research.
The automated system enables the effortless transfer of targets and substrates from the load lock to the PLD manipulator stations. Under full central PC control, it provides complete remote monitoring and control of sample and target positions, transfer and manipulation motions, and position states of associated interlocking valves. All sample information (including sample identification number, history in the UHV system, etc.) is stored in a database for retrieval and review by the central control system.
For efficient operation, the innovative transferring solution features a six-position target manipulator with an in-situ exchange system and allows transferring both, target and substrate holders using the same chamber port.
The process chamber is equipped with connecting flanges in UHV standard for connecting current and future equipment, including:
- laser,
- substrate manipulator with a temperature range,
- target manipulator,
- ion source with a power supply for cleaning, etching or activating the surface of the substrate,
- pumping system (based on the backup pump, TMP, ion pump & TSP pump),
- vacuum gauges with equipment,
- entry port for linear transferring systems e.g. from load lock, radial distribution chamber, transferring tunnel, or transport box,
- quartz balance with Z manipulator,
- RHEED/TorrRHEED with equipment,
- motorised or manual shutter (following the substrate) for vicinal layers or masks,
- additional gas dosing eg. for the reactive deposition process,
- viewports – observation windows with shutters,
- residual gas analyser,
- beam flux monitor,
- heated viewports for diagnostic devices.
The modular design of the system allows combining and integration with any other research platform via radial distribution transferring solution or transferring tunnel. The final design and functionality depend on the system configuration.
A pumping system combined with the standard volume of the process chamber allows for reaching the base pressure in the range of 1×10-8 – 5×10-11 mbar, depending on the pump’s configuration. A pumping system is a combination of different types of pumps, e.g. forevacuum pumps, ion pumps, cryo-pumps, turbo pumps, or titanium sublimation pumps, individually selected to achieve the best pumping performance according to specific application demands.
Synthesium process control software allows integration and perfect cooperation of sources of various types and manufacturers and enables easy recipe writing, automated growth control and extensive data recording. Allows integrating new additional components based on Tango open source device.
The system is equipped with advanced, easy-to-use power supplies and electronic devices controlling and supporting the sources and the whole included research equipment.
