Advanced PLD systems

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Advanced PLD systems

PREVAC customized PLD systems are sophisticated UHV platforms, that can be supplied as part of a larger integrated research system.

The PLD research module can be combined with an array of analytical and deposition techniques to create versatile designs for surface science and materials research. The list of accompanying techniques includes e.g. ARPES, IBS, magnetron sputtering, and MBE.

SKU: 442-1 Category:

Features

  • Multi-chamber, multi-technique PLD research platform made according to all your demands
  • Suited for the growth of ferromagnetic films, ceramic oxides, high temperature superconductive material, metallic multilayers and others
  • Vertical or horizontal PLD process geometry
  • EXCIMER or YAG lasers with a laser beam driving system
  • 1-4 axes, motorized or manual, substrate manipulator with receiving station able to achieve high temperatures up to 1400°C (with stable, long-life heater element made of Solid SiC)
  • Different substrate holders size: from 10×10 mm up to 8 inches
  • Six-position target manipulator with an in-situ target exchange system
  • Target holder sizes: 1 or 2 inches
  • Fully automated or manual target and substrate transferring system
  • Ion source with a power supply for cleaning, etching or activating the surface of the substrate
  • Base pressure from 1×10-8 to 5×10-11 mbar, depends on the pumping system 
  • Different standard types and sizes of the main chamber are available
  • Pumping system (based on the backing pump, TMP, ion pump & TSP)
  • Vacuum gauges with equipment
  • Range of solutions for sample preparation, e.g. gloveboxes, sample cleavers, or fully equipped preparation chambers designed for sample heating, cooling, cleaning, etc.
  • Transferring system based on linear transfer, radial distribution chamber, or transferring tunnel
  • Viewports – observation windows with shutter
  • Water cooling system with integrated blow-off line before bakeout
  • Bakeout system 
  • Modular frame prepared for extension
  • Synthesium software and HMI panel for full control over the deposition process & equipment
  • Fully automated process-driven recipes to combine highly flexible laser optics and operating pressure range
  • 19“ cabinets for electronic units

Description

Fully automated process-driven recipes combine highly flexible laser optics and operating pressure ranges, placing the system in a unique position to support leading-edge research.

The automated system enables the effortless transfer of targets and substrates from the load lock to the PLD manipulator stations. Under full central PC control, it provides complete remote monitoring and control of sample and target positions, transfer and manipulation motions, and position states of associated interlocking valves. All sample information (including sample identification number, history in the UHV system, etc.) is stored in a database for retrieval and review by the central control system.

For efficient operation, the innovative transferring solution features a six-position target manipulator with an in-situ exchange system and allows transferring both, target and substrate holders using the same chamber port.

The process chamber is equipped with connecting flanges in UHV standard for connecting current and future equipment, including:

  • laser,
  • substrate manipulator with a temperature range,
  • target manipulator,
  • ion source with a power supply for cleaning, etching or activating the surface of the substrate,
  • pumping system (based on the backup pump, TMP, ion pump & TSP pump),
  • vacuum gauges with equipment,
  • entry port for linear transferring systems e.g. from load lock, radial distribution chamber, transferring tunnel, or transport box,
  • quartz balance with Z manipulator,
  • RHEED/TorrRHEED with equipment,
  • motorised or manual shutter (following the substrate) for vicinal layers or masks,
  • additional gas dosing eg. for the reactive deposition process,
  • viewports – observation windows with shutters,
  • residual gas analyser,
  • beam flux monitor,
  • heated viewports for diagnostic devices.

The modular design of the system allows combining and integration with any other research platform via radial distribution transferring solution or transferring tunnel. The final design and functionality depend on the system configuration.

A pumping system combined with the standard volume of the process chamber allows for reaching the base pressure in the range of  1×10-8 – 5×10-11 mbar, depending on the pump’s configuration. A pumping system is a combination of different types of pumps, e.g. forevacuum pumps, ion pumps, cryo-pumps, turbo pumps, or titanium sublimation pumps, individually selected to achieve the best pumping performance according to specific application demands.

Synthesium process control software allows integration and perfect cooperation of sources of various types and manufacturers and enables easy recipe writing, automated growth control and extensive data recording. Allows integrating new additional components based on Tango open source device.

The system is equipped with advanced, easy-to-use power supplies and electronic devices controlling and supporting the sources and the whole included research equipment.

Options

  • RHEED/TorrRHEED with equipment
  • Motorised or manual shutter (following the substrate) for vicinal layers or masks
  • Laser power sensor
  • Additional storage chamber
  • Internal shield
  • Protection shield against cross-contamination
  • Vacuum suitcase (transport box) with a port in the load-lock chamber
  • Additional gas dosing eg. for the reactive deposition process
  • Residual gas analyser
  • Beam flux monitor
  • Heated viewports for the diagnostic devices
  • Pyrometer
  • Ellipsometer
  • Full control deposition process & equipment by PLC unit and Synthesium software 

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