Description
The process chamber contains 10 ports for evaporation sources and the substrate stage is intended for up to 4-inch diameter samples, with a heating & rotation option. It can be easily accessed through the load-lock chamber with the linear transferring system or directly by a differentially pumped door. The deposition process can be controlled over a wide temperature range (from LN2 up to 1400˚C) and can be fully software programmed and controlled via a PLC controller.
The process chamber is equipped with connecting flanges in UHV standard for connecting current and future equipment, including:
- up to 10 sources with flange DN 63CF (high or low-temperature, single or multi-filament),
- independent shutters with flange DN 63CF,
- valved cracker sources with a power supply,
- high-power e-guns with a power supply,
- substrate manipulator with a temperature range (from LN2 up to 1400˚C),
- pumping system (based on the backup pump, TMP, ion pump & TSP pump),
- vacuum gauges with equipment,
- entry port for linear transferring systems e.g. from load lock, radial distribution chamber, transferring tunnel, or transport box,
- quartz balance with Z manipulator,
- RHEED/TorrRHEED with equipment,
- motorised or manual shutter (following the substrate) for vicinal layers or masks,
- additional gas dosing system eg. for the reactive deposition process,
- viewports – observation windows with shutters,
- residual gas analyser,
- beam flux monitor,
- heated viewports for diagnostic devices.
The bottom flange can be easily removed/replaced using a specially designed trolley, thus a wide range of different sources configurations and options are available for your growth process. One versatile trolley can be used to replace both the bottom flange, cryo-panel, and liner (for easy cleaning). Thanks to the possibility of replacing the bottom flange with sources, one deposition chamber can be adapted to different applications.
The final design and functionality depend on the system configuration.
If needed, the system’s modular design allows combining and integrating with any other research platform via radial distribution transferring solution or transferring tunnel.
A pumping system combined with the standard volume of the process chamber allows for reaching the base pressure in the range of 5×10-10 – 5×10-11 mbar, depending on the pump’s configuration. A pumping system is a combination of different types of pumps, e.g. forevacuum pumps, ion pumps, cryo-pumps, turbo pumps, or titanium sublimation pumps, individually selected to achieve the best pumping performance according to specific application demands.
Synthesium process control software allows integration and perfect cooperation of sources of various types and manufacturers and enables easy recipe writing, automated growth control and extensive data recording. Allows integrating new additional components based on Tango open source device.
The system is equipped with advanced, easy-to-use power supplies and electronic devices controlling and supporting the sources and the whole included research equipment.
