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Standard HPPES systems

The PREVAC standard HPPES systems are intended for photoelectron spectroscopy experiments in the pressure range 2×10-9 mbar – 50 mbar, with controllable sample temperature. The standalone system is suited for the analysis of a wide range of nanomaterials in the UHV or ambient pressure condition.

The systems comprise an analysis chamber together with a load-lock chamber for easy and fast sample loading. It provides full PLC protection and software control including clear visualization of the machine state, data acquisition, and control of all integrated devices, power supplies, and ancillary.


  • Standard solution for most research needs in the field of:
    – XPS / UPS / ARPES / AES / EELS / ISS / IPES / LEIPS techniques | UHV condition
    HPXPS / APXPS / APUPS techniques | Ambient Pressure condition
  • Full automation of the experimental procedures
  • Backfilling configuration
  • High-pressure hemispherical energy analyser EA15-HP5 / EA15-HP50 with equipment
  • High-pressure, high-power dual anode X-ray source with monochromator – AlKα & AgLα, with a power supply
  • High-pressure, high-power dual anode, non-monochromatic X-ray source – AlKα & MgKα, with a power supply
  • UV source with a power supply
  • Flood source with a power supply
  • Ion source for depth profiling or cleaning
  • Motorized or manual 4-6 axes manipulator, with receiving station able to achieve temperatures from LHe/LN2 up to 1400°C
  • Different sample holders size: from 10×10 mm up to 2 inch
  • Analysis chamber Ø 310 mm
  • Base pressure is down to 10-9 mbar, depending on the pump’s configuration
  • Pumping system (based on the backup pump, TMP & TSP with cryo-shield)
  • Fully automated gas dosing setup
  • Vacuum gauges with equipment
  • Load Lock chamber for the sample holders
  • Reliable and fast linear transferring system from load-lock to the analysis chamber
  • Viewports – observation windows, with camera
  • Bakeout system
  • The adjustable rigid main frame of the system
  • 19“ cabinets with electronic units
  • Fully controlled analysis process & equipment by Spectrium software and PLC unit


The analysis chamber is equipped with connecting flanges in UHV standard for connecting current and future equipment, including:

  • high-pressure hemispherical energy analyser with equipment,
  • high-pressure X-ray twin anode monochromatic source with a power supply,
  • high-pressure X-ray twin anode non-monochromatic source with a power supply,
  • UV mono source with a power supply,
  • UV source with a power supply,
  • flood source with a power supply,
  • electron source with a power supply,
  • ion source with a power supply for depth profiling or cleaning,
  • gas cluster ion source with a power supply,
  • sample manipulator with a wide temperature range (from LHe/LN2 up to 1400˚C),
  • pumping set (based on the backup pump, TMP, ion pump & TSP with a huge area LN2 shroud),
  • vacuum gauges with equipment,
  • entry port for linear transferring systems e.g. from load lock to analysis chamber,
  • load Lock chamber for the sample holders,
  • viewports – observation windows,
  • residual gas analyser.

The final design and functionality depend on the system configuration.

A pumping system is a combination of different types of pumps, e.g. forevacuum pumps, ion pumps, turbo pumps, or titanium sublimation pumps with a huge area LN2 shroud, individually selected to achieve the best pumping performance according to specific application demands.

If needed, the modular design of the system allows combining and integration with any other research platform via radial distribution transferring solution or transferring tunnel.

Spectrium analysis control software allows integration and perfect cooperation of a hemispherical energy analyser, and sources of various types, enabling easy recipe writing, automated measuring control and extensive data recording. Allows integrating new additional components based on Tango open source device.


  • HP pressure cell with manipulator
  • Fully automated mixture chamber and 4 gas dosing setup
  • UV mono source with a power supply
  • Electron source with a power supply
  • Gas cluster ion source with a power supply
  • Storage chamber
  • Radial distribution chamber, or transferring tunnel
  • Vacuum suitcase (transport box) with a port in the load-lock chamber
  • Residual gas analyser
  • Pyrometer


Photoemission spectroscopy (PES) is an experimental technique and the main variant of electron spectroscopy. The method is based on the photoelectric phenomenon and the analysis of the kinetic energy distribution of photoelectrons. The energy emitted results from the surface sample’s excitation with electromagnetic radiation. 

The PES technique is the most frequently used method of surface testing and examination of thin layers. It provides information: on quantitative composition, atomic bonds characteristics, layers thickness. The basic process (photoeffect) measures the emission of photoelectrons as a result of irradiation of matter with photons. 

Includes analytical PES techniques: 

  • XPS – X-ray photoelectron spectroscopy 
  • HAXPES – hard X-ray spectroscopy 
  • UPS – ultraviolet photoelectron spectroscopy 
  • ARPES – angle-resolved photoemission spectroscopy 

Additional techniques: 

  • IPES – inverse photoemission spectroscopy 
  • LEIPS – low energy inverse photoelectron spectroscopy 
  • AES – auger electron spectroscopy 
  • EELS – electron energy loss spectroscopy 
  • ISS – ion scattering spectroscopy 

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